Equipment for electrical characterization

Piezometer

•    Measures piezoparameters of bulk ceramic materials and polymer films
•    Enables the measurement of d33, d31, d15, g33, g31 and g15 parameters
•    A wide measurement range of 0.01-999 pC/N
•    Programmable excitation range of 10-300Hz at 0.05-0.5N

Oscilloscope

•    Used for a wide range of easily customizable measurements of piezoelectric and ferroelectric materials as well as characterization and modification of electronic devices.
•    Enables the inspection of up to 4 analog and 16 digital channels
•    Bandwidth of 350MHz and a sampling rate of 5GSa/s
•    Built in 2MHz function generator

System for dielectric properties measurements

LCR meter Agilent Technologies 4284A equipped with Data Acquisition Switch Unit, a temperature chamber Delta 9039 and a furnace Nabertherm.

• For measurements of dielectirc properties in the radio-frequency region.
• Frequency range: 20 Hz - 1 MHz
• Temperature interval: - 170 °C - 300 °C (Delta 9039) and 30 °C - 700 °C (Nabertherm)

System for microwave properties measurements

Microwave network analyzer Agilent Technologies ONA E8361C equipped with a time domain, extended DC range, electronic calibration system, different systems for materials characterization and temperature chamber Ultra 2000.

• Enables dielectric properties measurement in the microwave region. For the characterization of thin films the “split post” dielectric resonator is used.
• Frequency range: 10 MHz - 67 GHz
• Temperature interval: 20 – 60 °C
• Transmission and reflection measurements
• Software support: Microwave studio.
• Financed by: Center of excellence in Nanoscience and Nanotechnology

Power device characterization system

Semi-automatic power device characterization system Cascade Microtech Tesla, on the basis of Summit 12K, equipped with an optical system, temperature chamber and with radio frequency, microwave and high-voltage probes.

• Enables connection with network analyzer, LCR meter and ferroelectric test system, and characterization of electrical properties of thin films.
• Frequency range: max. 67 GHz
• Temperature interval: - 55 – 200 °C
• Max. substrate dimension: 200 mm
• Financed by: Center of excellence in Nanoscience and Nanotechnology